Photosensitive metal nanoparticle and method of forming...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S281100, C430S286100, C430S287100, C430S288100, C430S916000

Reexamination Certificate

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10734138

ABSTRACT:
A photosensitive metal nanoparticle and a method of forming a conductive pattern using the same, wherein a self-assembled monolayer of a thiol compound or isocyanide compound having a terminal reactive group is formed on a surface of the metal nanoparticle and a photosensitive group is introduced to the terminal reactive group. The photosensitive metal nanoparticles can easily form a conductive film or pattern having excellent conductivity upon exposure to UV, and thus can be applied for antistatic washable sticky mats or shoes, conductive polyurethane printer rollers, electromagnetic interference shielding, etc.

REFERENCES:
patent: 2004/0241590 (2004-12-01), Park et al.
patent: 2006/0165912 (2006-07-01), Koberstein et al.
Chemical Abstract for Lu et al (“Micropatterns Constructed from Au Nanoparticles”, Chemical Communications, (9), p. 1056-1057 (2003)).
Lu et al (“Micropatterns Constructed from Au Nanoparticles”, Chemical Communications, (9), p. 1056-1057 (2003)).
Dr. G. Schon et al., A fascinating new field in colloid science: small ligand-stabilized metal clusters and possible application in microelectronics, Colloid Polym Sci (1995) 273, pp. 101-117, Steinkopff-Verlag 1995, Essen FRG.
Abraham Ulman, Formation and Structure of Self-Assembled Monolayers, Chem. Rev. 1996, American Chemical Society, pp. 1533-1554, Polytechnic University, Brooklyn, New York.
A.N. Goldstein et al., Melting in Semiconductor Nanocrystals, Reports, Science, vol. 256, Jun. 5, 1992, pp. 1425-1427.

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