Negative photoresists for short wavelength imaging

Details Negative photoresists for short wavelength imaging Negative photoresists for short wavelength imaging

2007-05-01

2007-05-01

Schilling, Richard L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S905000, C430S907000

Reexamination Certificate

active

10382090

ABSTRACT:
New negative-acting photoresist compositions are provided that are particularly useful for imaging at short wavelengths, particularly sub-200 nm wavelengths such as 193 nm. Resists of the invention provide contrast between exposed and unexposed coating layer regions through crosslinking or other solubility switching mechanism. Preferred resists of the invention include a resin component that contains repeat units that facilitate aqueous base solubility.

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