Projection system, in particular for a microlithographic...

Optical: systems and elements – Lens – With field curvature shaping

Reexamination Certificate

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C359S727000

Reexamination Certificate

active

11346201

ABSTRACT:
A projection system for imaging an object field onto an image field, including at least two partial objectives (S1, S2); at least one intermediate image field between the partial objectives (S1, S2); and a concave reflector (119, 219) having a concave reflecting surface. The concave reflecting surface crosses an optical axis of the projection system proximate along the optical axis to the intermediate image field. Alternatively or in addition, the concave reflecting surface crosses an optical axis of the projection system at a position where the condition |HCR/HMR|≧2 is met, with HCRbeing a chief ray height and HMRbeing a marginal ray height with respect to the optical axis. Alternatively or in addition, the concave reflecting surface crosses an optical axis of the projection system at a position where the condition: d=y*L is met, with d being an axial distance from the concave reflecting surface to the intermediate image field, and with L being the total geometrical light path travelled by a light beam along the optical axis from the object field to the image field, wherein y ranges from 0 to 0.10.

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patent: 2003-114387 (2003-04-01), None
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patent: WO 01/55767 (2001-08-01), None
patent: WO 03/050587 (2003-06-01), None
patent: WO 2004/019128 (2004-03-01), None

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