Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2007-01-16
2007-01-16
Siek, Vuthe (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000, C716S030000, C430S005000
Reexamination Certificate
active
10844987
ABSTRACT:
Shifters on a phase shifting mask (PSM) can be intelligently assigned their corresponding phase. Specifically, the phase of a shifter can be assigned based on simulating the contrast provided by each phase for that shifter. The higher the contrast, the better the lithographic performance of the shifter. Therefore, the phase providing the higher contrast can be selected for that shifter. To facilitate this phase assignment, a pre-shifter can be placed relative to a feature on the layout. The pre-shifter can then be divided into a plurality of shifter tiles for contrast analysis. Model-based data conversion allows for a comprehensive solution including both phase assignment as well as optical proximity correction.
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Bever Hoffman & Harms LLP
Harms Jeanette S.
Siek Vuthe
Synopsys Inc.
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