Positive resist composition and pattern formation method...

Details Positive resist composition and pattern formation method... Positive resist composition and pattern formation method...

2007-03-27

2007-03-27

Walke, Amanda (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S281100, C430S286100, C430S913000, C430S311000

Reexamination Certificate

active

10929443

ABSTRACT:
A positive resist composition comprising (A) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution and includes a specific repeating unit and (B) a compound that generates an acid upon irradiation of an actinic ray or radiation, and a pattern formation method using the positive resist composition.

REFERENCES:
patent: 6939662 (2005-09-01), Mizutani et al.
patent: 1 103 856 (2001-05-01), None
patent: 1273969 (2003-01-01), None
patent: 1341038 (2003-09-01), None
patent: 2002220420 (2002-08-01), None
patent: WO 01/37037 (2001-05-01), None
CA DN 137:161387 for JP2002220420,Aug. 2002.

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