Polymerizable silicon-containing compound, manufacturing...

Details Polymerizable silicon-containing compound, manufacturing... Polymerizable silicon-containing compound, manufacturing...

2007-03-20

2007-03-20

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S907000, C430S910000, C430S311000, C430S327000, C430S330000, C430S331000, C526S279000, C556S438000, C556S439000, C556S440000, C556S442000, C556S443000, C556S449000, C556S450000, C556S453000, C556S455000, C556S456000, C556S457000, C556S464000, C556S465000, C556S482000, C556S486000, C556S489000

Reexamination Certificate

active

10671732

ABSTRACT:
Polymerizable silicon-containing compounds of formula (1) wherein R1is hydrogen, halogen or monovalent organic group are polymerized into polymers. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching, and thus lends itself to micropatterning for the fabrication of VLSIs

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