Exposure apparatus, device manufacturing method, stage...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S072000, C355S067000

Reexamination Certificate

active

11377282

ABSTRACT:
An exposure apparatus for exposing a substrate to a pattern due to an original includes a substrate stage which holds and moves the substrate, and a first measurement unit which is arranged on the substrate stage, and measures a position of a mark formed on the original by projecting and receiving light.

REFERENCES:
patent: 5142156 (1992-08-01), Ozawa et al.
patent: 5671057 (1997-09-01), Kawai
patent: 5835560 (1998-11-01), Amemiya et al.
patent: 5978069 (1999-11-01), Kato
patent: 6381005 (2002-04-01), Kasumi et al.
patent: 6754303 (2004-06-01), Kasumi
patent: 2004/0004701 (2004-01-01), Kasumi
patent: 2004/0021866 (2004-02-01), Watts et al.
patent: 2829642 (1998-09-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Exposure apparatus, device manufacturing method, stage... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, device manufacturing method, stage..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus, device manufacturing method, stage... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3731770

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.