Defect detection using multiple sensors and parallel processing

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

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Details

C700S002000, C700S019000, C700S121000, C438S014000, C709S200000

Reexamination Certificate

active

11250799

ABSTRACT:
Techniques for detecting defects on semiconductor wafers are described. The techniques involve a parallel processing system wherein a data distribution system contains data distribution nodes that are interconnected by multiple data transfer paths. This configuration allows data collected by any of the detectors to be routed to any one of a plurality of processing nodes. This in turn allows a variety of defect analysis algorithms to be implemented.

REFERENCES:
patent: 4644461 (1987-02-01), Jennings
patent: 5699447 (1997-12-01), Alumot et al.
patent: 5737072 (1998-04-01), Emery et al.
patent: 5761064 (1998-06-01), La et al.
patent: 5933351 (1999-08-01), Balamurugan
patent: 5991699 (1999-11-01), Kulkarni et al.
patent: 6130967 (2000-10-01), Lee et al.
patent: 6370487 (2002-04-01), Dorough
patent: 6415188 (2002-07-01), Fernandez et al.
patent: 6529621 (2003-03-01), Glasser et al.
patent: 6614520 (2003-09-01), Bareket et al.
patent: 6701259 (2004-03-01), Dor et al.
patent: 6721939 (2004-04-01), Wang et al.
patent: WO00/68673 (2000-11-01), None

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