Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2007-09-11
2007-09-11
Bali, Vikkram (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
Reexamination Certificate
active
10062632
ABSTRACT:
In a pattern inspecting apparatus, images of places which can be expected to be the same pattern are compared with one another. However, a comparison of images obtained by different stage scans and the occurrence of a place capable of being inspected only once lead to a deterioration in the performance of detecting various error defects and an area incapable of being inspected, respectively. For solving this problem, defects detected in a high sensitivity condition are regarded as defect candidates and a critical threshold value, used as a boundary to detect a smaller value as a defect, of a defect candidate portion is obtained by an image processing circuit or an image of the defect candidate portion is obtained by processing with software. Further, the critical threshold value thus obtained is compared with plural threshold values, thereby permitting plural inspection results to be obtained in a single inspection.
REFERENCES:
patent: 4618938 (1986-10-01), Sandland et al.
patent: 5801965 (1998-09-01), Takagi et al.
patent: 6047083 (2000-04-01), Mizuno
patent: 6067153 (2000-05-01), Mizuno
patent: 6438438 (2002-08-01), Takagi et al.
patent: 6542830 (2003-04-01), Mizuno et al.
patent: 61278706 (1986-12-01), None
patent: 2146682 (1990-06-01), None
patent: 385742 (1991-04-01), None
patent: 3232250 (1991-12-01), None
patent: 5258703 (1993-10-01), None
patent: 75116 (1995-01-01), None
patent: 8245161 (1996-09-01), None
patent: 9312318 (1997-12-01), None
patent: 11160247 (1999-06-01), None
Hiroi Takashi
Isobe Mitsunobu
Kuni Asahiro
Miyai Hiroshi
Nara Yasuhiko
Antonelli, Terry Stout & Kraus, LLP.
Bali Vikkram
Hitachi , Ltd.
LandOfFree
Method and its apparatus for inspecting a pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and its apparatus for inspecting a pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and its apparatus for inspecting a pattern will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3727036