Substrate polishing apparatus

Details Substrate polishing apparatus Substrate polishing apparatus

2007-04-03

2007-04-03

Rose, Robert A. (Department: 3723)

Abrading

Abrading process

Glass or stone abrading

Reexamination Certificate

active

11241281

ABSTRACT:
A chemical mechanical polishing apparatus includes a rotating plate on which a substrate received, and a polishing pad which moves across the substrate as it rotates on the plate to polish the substrate. The load of the pad against the substrate, and the rotary speed of the plate, may be varied to control the rate of material removed by the pad.

REFERENCES:
patent: 4490948 (1985-01-01), Hanstein et al.
patent: 4956944 (1990-09-01), Ando et al.

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