Solvents and photoresist compositions for 193 nm imaging

Details Solvents and photoresist compositions for 193 nm imaging Solvents and photoresist compositions for 193 nm imaging

2007-04-17

2007-04-17

Gilliam, Barbara L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S306000, C430S320000, C430S322000, C430S434000, C430S494000

Reexamination Certificate

active

10418740

ABSTRACT:
New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm, particularly 193 nm. Resists of the invention comprise a polymer that is preferably substantially free of aromatic moieties and comprises photoacid-labile repeat units, a photoactive components such as one or more photoacid generator compounds and a solvent component that comprises methyl isoamyl ketone (5-methyl-2-hexanone).

REFERENCES:
patent: 2002/0031720 (2002-03-01), Nakamura et al.

Affiliated with

Also associated with

Rating

Solvents and photoresist compositions for 193 nm imaging does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Solvents and photoresist compositions for 193 nm imaging, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Solvents and photoresist compositions for 193 nm imaging will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3725464