Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-10-10
2006-10-10
Gilliam, Barbara L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S170000, C430S171000, C430S286100, C430S913000, C430S914000, C430S915000, C430S916000, C430S320000, C430S321000, C430S322000, C522S007000
Reexamination Certificate
active
07118845
ABSTRACT:
A process for fabricating of an article by exposing a photoreactive composition to light under multiphoton absorption conditions. The light passes through an optical system having a final optical element having a numeric aperture in a range of from 0.65 to 1.25, inclusive.
REFERENCES:
patent: 2801185 (1957-07-01), Iler et al.
patent: 3018262 (1962-01-01), Schroeder et al.
patent: 3117099 (1964-01-01), Proops et al.
patent: 3729313 (1973-04-01), Smith
patent: 3741769 (1973-06-01), Smith
patent: 3779778 (1973-12-01), Smith et al.
patent: 3808006 (1974-04-01), Smith
patent: 3954475 (1976-05-01), Bonham et al.
patent: 3987037 (1976-10-01), Bonham et al.
patent: 4250053 (1981-02-01), Smith
patent: 4257915 (1981-03-01), Eaton
patent: 4279717 (1981-07-01), Eckberg et al.
patent: 4394403 (1983-07-01), Smith
patent: 4394433 (1983-07-01), Gatzke
patent: 4491628 (1985-01-01), Ito et al.
patent: 4522958 (1985-06-01), Das et al.
patent: 4642126 (1987-02-01), Zador et al.
patent: 4652274 (1987-03-01), Boettcher et al.
patent: 4735632 (1988-04-01), Oxman et al.
patent: 4751138 (1988-06-01), Tumey et al.
patent: 4859572 (1989-08-01), Farid et al.
patent: 4889792 (1989-12-01), Palazzotto
patent: 4954416 (1990-09-01), Wright et al.
patent: 4963471 (1990-10-01), Trout et al.
patent: 5235015 (1993-08-01), Ali et al.
patent: 5238744 (1993-08-01), Williams et al.
patent: 5307438 (1994-04-01), Bilkadi et al.
patent: 5335240 (1994-08-01), Ho et al.
patent: 5496682 (1996-03-01), Quadir et al.
patent: 5545676 (1996-08-01), Palazzotto et al.
patent: 5648407 (1997-07-01), Goetz et al.
patent: 5753346 (1998-05-01), Leir et al.
patent: 5770737 (1998-06-01), Reinhardt et al.
patent: 5856373 (1999-01-01), Kaisaki et al.
patent: 5859251 (1999-01-01), Reinhardt et al.
patent: 5990479 (1999-11-01), Weiss et al.
patent: 5998495 (1999-12-01), Oxman et al.
patent: 6005707 (1999-12-01), Berggren et al.
patent: 6025406 (2000-02-01), Oxman et al.
patent: 6054007 (2000-04-01), Boyd et al.
patent: 6100405 (2000-08-01), Reinhardt et al.
patent: 6322901 (2001-11-01), Bawendi et al.
patent: 6501091 (2002-12-01), Bawendi et al.
patent: 2002/0062782 (2002-05-01), Norris et al.
patent: 0 977 212 (2000-02-01), None
patent: 1 052 312 (2000-11-01), None
patent: WO 98/21521 (1998-05-01), None
patent: WO 99/53242 (1999-10-01), None
patent: WO 00/17655 (2000-03-01), None
patent: WO 00/17656 (2000-03-01), None
patent: WO 00/73421 (2000-12-01), None
patent: WO 01/18283 (2001-03-01), None
patent: WO 01/61040 (2001-08-01), None
patent: WO 01/96409 (2001-12-01), None
patent: WO 01/96452 (2001-12-01), None
patent: WO 01/96915 (2001-12-01), None
patent: WO 01/96917 (2001-12-01), None
patent: WO 01/96952 (2001-12-01), None
patent: WO 01/96958 (2001-12-01), None
patent: WO 01/96959 (2001-12-01), None
patent: WO 01/96961 (2001-12-01), None
patent: WO 01/96962 (2001-12-01), None
R. D. Allen et al. in “High Performance Acrylic Polymers for Chemically Amplified Photoresist Applications”, J. Vac. Sci. Technol. B (1991), 9, 3357-3361.
R. D. Allen “Advances in Resist Technology and Processing XII”, Proc. SPIE (1995), 2438, 474-485.
Stober et al. in “Controlled Growth of Monodisperse Silica Spheres in the Micron Size Range”, Journal of Colloid and Interface Science (1968), 26, 62-69.
Wakabayashi et al. in “Studies on s-Triazines. I. Cotrimerization of Trichloroacetonitrile with Other Nitriles”, Bull. Chem. Soc. Japan (1969), 42, 2924-2930.
C. Xu et al. in “Measurement of Two-Photon Excitation Cross Sections of Molecular Fluorophores with Data from 690 to 1050 nm”, J. Opt. Soc. Am. B. (1996), 13, 481-491.
I. B. Berlman inHandbook of Fluorescence Spectra of Aromatic Molecules, Second Edition, Academic Press, New York, pp. 24-27 (1971).
J. N. Demas et al. in “The Measurement of Photoluminescence Quantum yields. A Review”, J. Phys. Chem. (1971) 75, 991-1024.
J. V. Morris et al. in “Fluorescence Quantum Yield Determinations. 9,10-Diphenylanthracene as a Reference Standard in Different Solvents”, J. Phys. Chem. (1976), 80, 969-974.
Beringer et al. in “Diaryliodonium Salts. IX. The Synmthesis of Substituted Diphenyliodonium Salts,” J. Am. Chem. Soc. (1959), 81, 342-351.
R.A. Andrievsky in “State-of-the-Art and Perspectives in the Field of Particulate Nanostructured Materials”, J. Mater Sci. Technol. (1988), 14, 97.
L.L. Beecroft et al. in “Nanocomposite Materials for Optical Applications”, Chem. Mater. (1997), 9, 1302-1317.
S. Empedocles in “Detection and Spectroscopy of Single CdSe Nanocrystallite Quantum Dots”, pp. 13-27 (1999).
Hirai et al. in “Preparation of Semiconductor Nanoparticle-Polymer Composites by Direct Reverse Micelle Polymerization Using Polymerizable Surfactants”, J. Phys. Chem. B. (2000), 104, 8962-8966.
Lee et al. in “Full Color Emission from II-VI Semiconductor Quantum Dot-Polymer Composites”, Adv. Mater. (2000), 12(15), 1102-1105.
Bruchez et al. in “Semiconductor Nanocrystals as Fluorescent Biological Labels”, Science (1998), 281(5385), pp. 2013-2016.
Hoffman et al. in “Photoinitiated Polymerization of Methyl Methacrylate Using Q-Sized ZnO Colloids”, J. Phys. Chem. (1992), 96, 5540-5546.
Ulrich et al. in “Green Emission and Bandgap Narrowing Due to Two-Photon Excitation in Thin Film CdS Formed by Spray Pyrolysis”, Semicond. Sci. Technol. (2001), 16, L37-L39.
Hines et al. in “Bright UV-Blume Luminescent Colloidal ZnSe Nanocrystals”, Journal of Physical Chemistry B (1998), vol. 102(19), 3654-3657.
Holmes et al. in “Highly Luminscent Silicon Nanocrystals with Discrete Optical Transitions”, J. Am. Chem. Soc. (2001), 123, 3743-3748.
M. Albota et al. in “Design of Organic Molecules with Large Two-Photon Absorption Cross Sections”, Science (1998), 281, 1653-1656.
B. H. Cumpston et al. in “Two-Photon Polymerization Initiators for Three-Dimensional Optical Data Storage and Microfabrication”, Nature (1999), 398, 51-54.
S. Kawata et al. in “Finer Features for Functional Microdevices”, Nature (2001), 412, 697-698.
S. Mauro and S. Kawata in “Two-Photon Absorbed Near-Infrared Photopolymerization for Three-Dimensional Microfabrication”, J. Microelectromech. Syst. (1998), 7, 411-415.
S. Mauro et al. in “Three-Dimensional Microfabrication with Two-Photon-Absorbed Photopolymerization”, Opt. Lett. (1997), 22, 132-134.
K. D. Belfield in “Near-IR Two-Photon Photoinitiated Polymerization Using a Fluorone/Amine Initiating System”, J. Am. Chem. Soc. (2000), 122, 1217-1218.
P. J. Campagnola in “3-Dimensional Submicron Polymerization of Acrylamide by Multiphoton Excitation of Xanthene Dyes”, Macromol. (2000), 33, 1511-1513.
H.-B. Sun et al. in “Real Three-Dimensional Microstructures Fabricated by Photopolymerization of Resins Through Two-Photon Absorption”, Opt. Lett. (2000), 25, 1110-1112.
M. Miwa et al. in “Femtosecond Two-Photon Stereo-Lithography”, Appl. Phys. A. (2001), 73, 561-566.
H.-B. Sun et al. in “Three-Dimensional Focal Spots Related to Two-Photon Excitation”, Appl. Phys. Lett. (2002), 80, 3673-3675.
S. M. Kuebler et al. in “Optimizing Two-Photon Initiators and Exposure Conditions for Three-Dimensional Lithographic Microfabrication”, J. of Photopolymer Science and Technology (2001), 14, 657-668.
Ch. J. Schwarz in “Demonstration of Two-Photon Lithography”, J. Vac. Sci. Technol. (2001), 19, 2362-2365.
A. Reiser, “Photoreactive Polymers, The Science and Technology of Resists”, John Wiley & Sons, New York, 227-251 (1989).
M. P. Joshi et al. in “Three-Dimensional Optical Circuitry Using Two-Photon-Assisted Polymerization”, Appl. Phys. Lett. (1999), 74, 170-172.
Y. Boiko et al. in “High Dynamic Range Cationic Two-Photon Photopolymerization”, Proceedings SPIE, Organic Photonic Materials and Devi
DeVoe Robert J.
Kalweit Harvey W.
Leatherdale Catherine A.
Williams Todd R.
3M Innovative Properties Company
Cleveland David R.
Gilliam Barbara L.
Weiss Lucy C.
Wright Bradford B.
LandOfFree
Multiphoton photochemical process and articles preparable... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Multiphoton photochemical process and articles preparable..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multiphoton photochemical process and articles preparable... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3716894