Positive resist composition and method of forming a resist...

Details Positive resist composition and method of forming a resist... Positive resist composition and method of forming a resist...

2006-10-10

2006-10-10

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S907000, C430S906000, C430S910000, C430S914000, C430S326000

Reexamination Certificate

active

07118846

ABSTRACT:
A positive resist composition comprises (A) a resin comprising specific repeating units and coming to have enhanced solubility in an alkaline developing solution by the action of an acid and (B) a compound generating an acid by the action of actinic rays or a radiation.

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patent: WO 00/17712 (2000-03-01), None
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Shintaro Yamada et al., “Design and Study of Resist Materials for 157nm Lithography”, Advances in Resist Technology and Processing XX. Theodore H. Fedynyshyn, Proceedings of SPIE vol. 5039 (2003), pp. 569-579.
Partial European Search Report dated Sep. 2, 2004.
European Search Report dated May 6, 2005.

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