Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-02-28
2006-02-28
Thornton, Yvette C (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S311000, C430S330000, C430S905000, C430S907000, C430S910000, C526S282000, C526S319000, C526S242000, C524S558000
Reexamination Certificate
active
07005228
ABSTRACT:
A ternary copolymer comprising units of α-trifluoromethylacrylic carboxylate having acid labile groups substituted thereon, units of α-trifluoromethylacrylic carboxylate having adhesive groups substituted thereon, and units of styrene having hexafluoroalcohol pendants is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing.
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Endo Masayuki
Harada Yuji
Hatakeyama Jun
Kawai Yoshio
Kishimura Shinji
Central Glass Co. Ltd.
Matsushita Electric - Industrial Co., Ltd.
Millen White Zelano & Branigan P.C.
Shin-Etsu Chemical Co. , Ltd.
Thornton Yvette C
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