Split gate flash memory cell

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

07005698

ABSTRACT:
A split gate flash memory cell. The memory cell includes a substrate, a conductive line, source/drain regions, an insulating layer, a conductive spacer, an insulating stud, a first conductive layer, and a first insulating spacer. The conductive line is disposed in a lower portion of the trench of the substrate. The source region is formed in the substrate adjacent to an upper portion of the conductive line having the insulating layer thereon. The conductive spacer is disposed on the upper sidewall of the trench serving as a floating gate. The insulating stud is disposed on the insulating layer. The first conductive layer is disposed over the substrate adjacent to the conductive spacer serving as a control gate. The first insulating spacer is disposed on the sidewall of the insulating stud to cover the first conductive layer. The drain region is formed in the substrate adjacent to the first conductive layer.

REFERENCES:
patent: 5429970 (1995-07-01), Hong
patent: 5606521 (1997-02-01), Kuo et al.
patent: 6124608 (2000-09-01), Liu et al.
patent: 6255689 (2001-07-01), Lee
patent: 6303439 (2001-10-01), Lee et al.
patent: 6391719 (2002-05-01), Lin et al.
patent: 2001/0038118 (2001-11-01), Sakui et al.
patent: 2002/0024081 (2002-02-01), Gratz

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Split gate flash memory cell does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Split gate flash memory cell, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Split gate flash memory cell will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3709523

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.