Method of manufacturing semiconductor integrated circuit...

Details Method of manufacturing semiconductor integrated circuit... Method of manufacturing semiconductor integrated circuit...

2006-10-24

2006-10-24

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S005000, C430S396000

Reexamination Certificate

active

07125651

ABSTRACT:
In order to suppress or prevent the occurrence of foreign matter in the manufacture of a semiconductor integrated circuit device by the use of a photo mask constituted in such a manner that a resist film is made to function as a light screening film, inspection or exposure treatment is carried out, when the photo mask1PA1has been mounted on a predetermined apparatus such as, e.g., an inspection equipment or aligner, in the state in which a mounting portion2of the predetermined apparatus is contacted with that region of a major surface of a mask substrate1aof the photo mask1PA1in which a light shielding pattern1band a mask pattern1mr, each formed of a resist film, on the major surface of the mask substrate1ado not exist.

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