Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2006-02-14
2006-02-14
Siek, Vuthe (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000
Reexamination Certificate
active
07000207
ABSTRACT:
A system and method for providing the layout of non-Manhattan shaped integrated circuit elements using a Manhattan layout system utilizes a plurality of minimal sized polygons (e.g., rectangles) to fit within the boundaries of the non-Manhattan element. The rectangles are fit such that at least one vertex of each rectangle coincides with a grid point on the Manhattan layout system. Preferably, the rectangles are defined by using the spacing being adjacent grid points as the height of each rectangle. As the distance between adjacent grid points decreases, the layout better matches the actual shape of the non-Manhattan element. The system and method then allows for electrical and optical circuit elements to be laid out simultaneously, using the same layout software and equipment.
REFERENCES:
patent: 4820928 (1989-04-01), Ooyama et al.
patent: 5723233 (1998-03-01), Garza et al.
patent: 6269472 (2001-07-01), Garza et al.
patent: 6324673 (2001-11-01), Luo et al.
patent: 6517751 (2003-02-01), Hambright
patent: 6526555 (2003-02-01), Teig et al.
Ghiron Margaret
Gothoskar Prakash
Montgomery Robert Keith
Patel Vipulkumar
Pathak Soham
Siek Vuthe
SiOptical Inc.
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