Transistor-arrangement, method for operating a transistor...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S314000, C257S315000, C257S316000

Reexamination Certificate

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07154138

ABSTRACT:
The invention relates to a transistor arrangement having a substrate and a vertical transistor comprising: a first electrode region, a second electrode region arranged essentially above the latter, and, in between, a channel region, and also a gate region beside the channel region and, in between, an electrically insulating layer sequence, wherein two mutually spatially separate sections of the electrically insulating layer sequence in each case serve for the storage of charge carriers.

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patent: 8-162547 (1996-06-01), None
patent: 2001 156188 (2001-06-01), None
patent: WO 98/06139 (1998-02-01), None
Widmann, D. et al., “Technologie hochintergrierter Schaltungen,” [Technology of Largescale Integrated Circuits], Chapter 8.4, Springer Verlag, Berlin, IBSN 3-540-59357-8, 1996.
Patent Abstracts of Japan, vol. 1996, No. 10, Oct. 31, 1996, Abstract of JP 08-162547.
Eitan, B., et al., “NROM: A Novel Localized Trapping, 2-Bit Nonvolatile Memory Cell,” IEEE Electron Device Letters, vol. 21, No. 11, pp. 543-545, 2000.
Patent Abstracts of Japan, vol. 2000, No. 23, Feb. 10, 2001, Abstract of JP 2001-156188.

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