Exposure apparatus and method

Details Exposure apparatus and method Exposure apparatus and method

2006-12-26

2006-12-26

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000, C355S070000, C355S071000, C356S399000, C356S400000

Reexamination Certificate

active

07154582

ABSTRACT:
An exposure apparatus for projecting a pattern of a reticle onto an object to be exposed with first light having a wavelength of 20 nm or smaller, said exposure apparatus comprising a projection optical system for projecting the pattern onto the object, and a position detecting system for detecting a positional information of a mark by receiving a second light having a wavelength different from that of the first light via the projection optical system.

REFERENCES:
patent: 5850279 (1998-12-01), Nara et al.
patent: 6727980 (2004-04-01), Ota et al.
patent: 2002/0175300 (2002-11-01), Suzuki et al.
patent: 2005/0046846 (2005-03-01), Chandhok

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