Method and apparatus for beam current fluctuation correction

Radiant energy – Inspection of solids or liquids by charged particles – Electron microscope type

Reexamination Certificate

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C250S306000, C250S307000

Reexamination Certificate

active

07091486

ABSTRACT:
One embodiment disclosed relates to an electron beam imaging apparatus. An electron source is configured to generate an electron beam, and a beam-limiting aperture is configured to block a portion of the electron beam and to allow transmission of another portion of the electron beam through the aperture. A first detector is configured to detect scattered electrons emitted by the aperture due to the blocked portion of the electron beam. The imaging apparatus may also include a second detector configured to detect scattered electrons emitted by the sample due to impingement of the transmitted portion of the electron beam. A gain control device may also be included to adjust a gain of a detected signal derived from the second detector using a control signal derived from the first detector. Another embodiment disclosed relates to an electron beam lithography apparatus. The lithography apparatus may adjust a pixel dwell time based on a control signal derived from the scattered electrons emitted by the aperture.

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patent: 4937458 (1990-06-01), Fujikura
patent: 5254857 (1993-10-01), Ross et al.
patent: 5449915 (1995-09-01), Yamada et al.
patent: 6169282 (2001-01-01), Maeda et al.
patent: 6426501 (2002-07-01), Nakagawa
patent: 6555830 (2003-04-01), Mankos et al.
patent: 6617597 (2003-09-01), Hilton
patent: WO 03/032361 (2003-04-01), None

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