Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1995-11-15
2000-04-04
Crane, Sara W.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257355, 257653, H01L 2702
Patent
active
060464763
ABSTRACT:
In an input protection circuit having an SOI structure for protecting a MOSFET against breaking caused by a high voltage such as static electricity, a trench is provided in an SOI substrate to vertically pass through a silicon layer and a buried oxide film and reach the interior of a P-type silicon substrate. An n.sup.+ polysilicon layer is buried in the trench, to be connected with the silicon substrate by a P-N junction. A wire is connected to the n.sup.+ polysilicon layer. An end of the wire is connected to an input pad, and another end thereof is connected to an internal circuit. An input voltage is limited by an avalanche breakdown at the P-N junction in the interface between the n.sup.+ polysilicon layer and the P-type silicon substrate.
REFERENCES:
patent: 5113236 (1992-05-01), Arnold et al.
patent: 5382818 (1995-01-01), Pein
ULSI DRAM Technology, Sep. 25, 1992, p. 67.
Arimoto Kazutami
Morishita Fukashi
Crane Sara W.
Hardy David B.
Mitsubishi Denki & Kabushiki Kaisha
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