Polymers, resist compositions and patterning process

Details Polymers, resist compositions and patterning process Polymers, resist compositions and patterning process

2006-06-27

2006-06-27

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S905000, C430S907000, C430S910000, C526S281000

Reexamination Certificate

active

07067231

ABSTRACT:
A polymer comprising recurring units having a partial structure of formula (1) wherein R1is a single bond or alkylene or fluoroalkylene, R2and R3are H or alkyl or fluoroalkyl, at least one of R2and R3contains at least one fluorine atom is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance

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