Methods for forming superconducting conductors

Details Methods for forming superconducting conductors Methods for forming superconducting conductors

2006-02-14

2006-02-14

Versteeg, Steven (Department: 1753)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S192120, C427S062000, C427S402000, C427S419300

Reexamination Certificate

active

06998028

ABSTRACT:
A method for producing a superconducting conductor is disclosed, including providing a substrate, depositing a buffer film having a biaxial texture to overlie the substrate by reactive sputtering, and depositing a superconducting layer to overlie the buffer film. Deposition of the buffer film is carried out by exposing the substrate along a deposition zone to a material plume generated by bombarding a target in the presence of a magnetic field, the deposition zone having a length of at least 1.0 m. The assist ions may be generated from a gridless ion source. The buffer film may have a biaxial texture having an out-of-plane crystallographic texture represented by a mosaic spread of not greater than 30°.

REFERENCES:
patent: 5196399 (1993-03-01), Shiota et al.
Vossen et al., “Thin Film Processes”, p. 48-49 (1978).
S. Gnanarajan, et al., “YBCO/YSZ/HASTELLOY Superconducting Tapes by IBAD Magnetron Deposition”, The American Ceramic Society, vol. 140, pp. 211-218, 2002.
A. Malozemoff, et al., “Scale-Up of Second Generation HTS Wire (2G-YBCO Coated Conductor)”, American Superconductor Corporation, DOE Peer Review, Jul. 2004, pp. 1-62.

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