Semiconductor device having capacitor and method of...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S303000, C257S306000

Reexamination Certificate

active

06998663

ABSTRACT:
A semiconductor device, comprising a first wiring formed in a first insulating film, a second insulating film formed on the first insulating film, a first electrode film selectively formed on the second insulating film, a third insulating film formed on the first electrode film, and having an end portion and a central portion, wherein the end portion has a thickness thinner than the central portion, a second electrode film formed on the central portion of the third insulating film such that the second electrode film faces the first electrode film.

REFERENCES:
patent: 5874770 (1999-02-01), Saia et al.
patent: 6066868 (2000-05-01), Evans, Jr.
patent: 6180976 (2001-01-01), Roy
patent: 6459562 (2002-10-01), KarRoy et al.
patent: 6657247 (2003-12-01), Yoshiyama et al.
patent: 2-162731 (1990-06-01), None
patent: 3-174729 (1991-07-01), None
patent: 7-130733 (1995-05-01), None
R. Mahnkopr, et al., “System on a Chip” Technology Platform for 0.18 μm Digital, Mixed Signal & eDRAM Applications, Proceeding of IEDM Technology Digest 849, 1999, pp. 1-4.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device having capacitor and method of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device having capacitor and method of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device having capacitor and method of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3657605

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.