Apparatus and associated method for conditioning in chemical...

Details Apparatus and associated method for conditioning in chemical... Apparatus and associated method for conditioning in chemical...

2006-02-28

2006-02-28

Rose, Robert A. (Department: 3723)

Abrading

Machine

Combined

C451S443000

Reexamination Certificate

active

07004825

ABSTRACT:
A conditioning apparatus for use in a CMP system is provided along with an associated method of operation. The conditioning apparatus includes rotation mechanics and oscillation mechanics. The rotation mechanics are capable of rotating a shaft which causes a holder and a conditioning substrate to be rotated. The oscillation mechanics are capable of moving a position of the shaft within a region defined by a peripheral boundary that is less than and within an outer periphery of the conditioning substrate. A conditioning substrate backing is also included in the conditioning apparatus. The conditioning substrate backing defines a differential pressure distribution that is capable of being applied to the conditioning substrate.

REFERENCES:
patent: 5885137 (1999-03-01), Ploessl
patent: 5975994 (1999-11-01), Sandhu et al.
patent: 6190243 (2001-02-01), Wada et al.
patent: 6508697 (2003-01-01), Benner et al.
patent: 6648731 (2003-11-01), Shin

Affiliated with

Also associated with

Rating

Apparatus and associated method for conditioning in chemical... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and associated method for conditioning in chemical..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and associated method for conditioning in chemical... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3644911