Method of manufacturing thin-film magnetic head

Details Method of manufacturing thin-film magnetic head Method of manufacturing thin-film magnetic head

2006-11-28

2006-11-28

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C430S315000, C430S319000, C430S394000, C029S603070

Reexamination Certificate

active

07141357

ABSTRACT:
A track width defining layer includes: a track width defining portion having an end located in the air bearing surface and the other end located opposite to the air bearing surface; and a wide portion coupled to the other end of the track width defining portion. The track width defining layer is formed by frame plating. A frame is formed by exposing and developing a resist layer. The step of exposing the resist layer includes: a first exposure step for forming a first latent image in the resist layer; and a second exposure step for forming a second latent image in the resist layer. The first latent image is made up of a first portion corresponding to the track width defining portion and a second portion adjoining the first portion and extending along the contour of the wide portion. The second latent image is intended for use in combination with the first latent image so as to form a latent image corresponding to the track width defining layer, and does not include a portion corresponding to the track width defining portion.

REFERENCES:
patent: 5793578 (1998-08-01), Heim et al.
patent: 6259583 (2001-07-01), Fontana, Jr. et al.
patent: 6400525 (2002-06-01), Sasaki et al.
patent: 6410212 (2002-06-01), Sato
patent: 2004/0060165 (2004-04-01), Sasaki
patent: 2000-173013 (2000-06-01), None

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