Method for creating alternating phase masks

Details Method for creating alternating phase masks Method for creating alternating phase masks

2006-11-28

2006-11-28

Kik, Phallaka (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C430S005000, C378S035000, C700S120000, C700S121000

Reexamination Certificate

active

07143390

ABSTRACT:
A method is provided for creating a phase mask for lithographic exposure operations. In this case, phase-shifting regions (10) with a different phase are defined on both sides of critical structures (6), which fall below an extent limit. At least one phase shifter correction is carried out such that at least two mutually facing phase-shifting regions (10) are joined together to form a contiguous phase-shifting region (10) if their distance from one another falls below a predetermined minimum distance.

REFERENCES:
patent: 5538815 (1996-07-01), Oi et al.
patent: 5576126 (1996-11-01), Rolfson
patent: 6680151 (2004-01-01), Heissmeier et al.
patent: 6730463 (2004-05-01), Heissmeier et al.
patent: 2003/0140331 (2003-07-01), Ludwig et al.
patent: 2003/0203290 (2003-10-01), Misaka
patent: 2005/0008952 (2005-01-01), Dulman et al.
patent: 100 57 437 (2002-02-01), None
patent: 100 57 438 (2002-02-01), None
patent: 101 29 202 (2002-09-01), None
patent: 101 19 145 (2002-11-01), None
Socha et al., “Models for Characterizing Phase-Shift Defects in Optical Projection Printing”, IEEE Transactions on Semiconductor Manufacturing, vol. 8, No. 2, May 1995, pp. 139-149.

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