Positive resist composition

Details Positive resist composition Positive resist composition

2006-11-21

2006-11-21

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S907000, C430S910000, C430S921000

Reexamination Certificate

active

07138217

ABSTRACT:
A positive resist composition comprises: (A) a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developer; and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation, wherein the resin (A) contains a specified repeating unit.

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patent: 2002/0061464 (2002-05-01), Aoai et al.
patent: 2002/0155376 (2002-10-01), Hashimoto et al.
patent: 42 07 261 A1 (1993-09-01), None
patent: WO 00/67072 (2000-09-01), None
Ito et al. J.Vacuum Sci. Tech.B, 2001 19(6) 2678-2684.

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