Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-02-07
2006-02-07
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S327000, C430S328000, C430S330000, C430S331000, C430S313000, C430S317000, C430S905000, C430S907000, C430S910000, C430S914000, C526S279000
Reexamination Certificate
active
06994945
ABSTRACT:
Novel silicon-containing polymers are obtained by copolymerizing a vinylsilane monomer with a compound having a low electron density unsaturated bond such as maleic anhydride, maleimide derivatives or tetrafluoroethylene. Using the polymers, chemical amplification positive resist compositions sensitive to high-energy radiation and having a high sensitivity and resolution at a wavelength of less than 300 nm and improved resistance to oxygen plasma etching are obtained.
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Hatakeyama Jun
Ishihara Toshinobu
Kubota Tohru
Kubota Yasufumi
Takeda Takanobu
Lee Sin
Millen White Zelano & Branigan P.C.
Shin-Etsu Chemical Co. , Ltd.
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