Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-06-17
2000-04-04
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430905, 430910, G03F 7004
Patent
active
060459689
ABSTRACT:
A photosensitive composition contains an acid-decomposable resin, a photo-acid-generating agent, and a naphthol novolak compound with a molecular weight of 2000 or less. The acid-decomposable resin is preferably a copolymer consisting of a polymerizable compound having an alicyclic skeleton as a monomer.
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Asakawa Koji
Nakase Makoto
Okino Takeshi
Shida Naomi
Ushirogouchi Toru
Chu John S.
Kabushiki Kaisha Toshiba
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