Positive resist containing naphthol functionality

Details Positive resist containing naphthol functionality Positive resist containing naphthol functionality

Filed on

2006-10-31

Date issued

2006-10-31

Examiner

Hamilton, Cynthia (Department: 1752)

Patent Class

Radiation imagery chemistry: process, composition, or product th

SubClass

Imaging affecting physical property of radiation sensitive...

SubSubClass

Radiation sensitive composition or product or process of making

Other Related Categories

C430S326000

Type

Reexamination Certificate

Status

active

Patent number

07129016

Description

ABSTRACT:
Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation are obtained using a polymer having acrylate/methacrylate monomeric units comprising a naphthol ester group. The resist may optionally contain polymer having acrylate/methacrylate monomeric units with fluorine-containing functional groups. The resists containing the polymer having acrylate/methacrylate monomeric units comprising a naphthol ester group have an improved process window, including improved etch resistance and reduced swelling compared to conventional fluorine-containing 193 nm resist.

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patent: 6303266 (2001-10-01), Okino et al.
patent: 2001/0036590 (2001-11-01), Adegawa

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