Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2006-02-21
2006-02-21
Fourson, George (Department: 2823)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
C430S269000, C430S311000
Reexamination Certificate
active
07001853
ABSTRACT:
This invention provides methods and systems, e.g., to control the flow of photo-polymerizable resins. In the method, e.g., flow of a photo-polymerizable resin is restricted from illuminated resin exclusion regions on a substrate surface by precisely situated flow barriers. A system to control photo-polymerizable resin flow includes, e.g., a light source, a mask and a substrate.
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Brown Timothy B.
Kurth Richard
Caliper Life Sciences, Inc.
Fourson George
Maldonado Julio J.
McKenna Donald R.
Petersen Ann C.
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