Method for adjusting gap between two objects and exposure...

Details Method for adjusting gap between two objects and exposure... Method for adjusting gap between two objects and exposure...

2006-06-13

2006-06-13

Slick, Edward J. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Lithography

C250S492100

Reexamination Certificate

active

07062010

ABSTRACT:
There is provided a method of making a gap between first and second objects have a predetermined value. The method includes steps of introducing light to an entry window on the first object, detecting an intensity of light from an exit window on the first object, the exit window being at such a position that light would enter through the entry window of the first object, reflect on the second object, and then enter the exit window of the first object if the gap has the predetermined value, and positioning the second object, with respect to a direction concerning the gap, based on an intensity of light detected in the detecting step.

REFERENCES:
patent: 4085329 (1978-04-01), McCoy et al.
patent: 4187431 (1980-02-01), Hundt
patent: 5114236 (1992-05-01), Matsugu et al.
patent: 5151754 (1992-09-01), Ishibashi et al.
patent: 5239183 (1993-08-01), Kouno et al.
patent: 5291023 (1994-03-01), Hasegawa et al.
patent: 6144719 (2000-11-01), Hasegawa et al.
patent: 6154281 (2000-11-01), Sentoku et al.
patent: 2003/0020891 (2003-01-01), Tokita

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