Resist compositions and patterning process

Details Resist compositions and patterning process Resist compositions and patterning process

2006-02-21

2006-02-21

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S326000, C430S907000, C526S242000, C526S281000

Reexamination Certificate

active

07001707

ABSTRACT:
A resist composition comprising a blend of a cyclic polymer having alcoholic groups as soluble groups and a polymer having carboxyl or hexafluoroalcohol groups whose hydrogen atoms are replaced by acid labile groups as a base resin forms a resist film which is improved in transparency, alkali dissolution contrast and plasma etching resistance.

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