Patterned product and its manufacturing method

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant

Reexamination Certificate

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C216S042000, C216S044000, C216S089000

Reexamination Certificate

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07041229

ABSTRACT:
To provide a manufacturing method for simultaneously forming machined patterns different in dept in a small number of steps and a machined pattern having a U-shaped sectional form in which depths and widths are smoothly changed. Mask patterns62respectively having a semicircular sectional form and mask patterns65respectively having a V-shaped sectional form are formed at different opening widths63and64respectively to perform sandblasting by using the mask patterns62and65as masks. Though a deep groove is formed between the semicircular-sectional-form mask patterns62,a shallow groove is formed between the V-shaped-sectional-form mask patterns65.

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patent: 5506720 (1996-04-01), Yoon
patent: 5851928 (1998-12-01), Cripe et al.
patent: 6340812 (2002-01-01), Izumi et al.
patent: 6475068 (2002-11-01), Jimbo et al.
patent: 07-282730 (1995-10-01), None
patent: 09-092135 (1997-04-01), None
patent: 2000-123747 (2000-04-01), None
patent: 2001-035365 (2001-02-01), None

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