Near-field exposure photoresist and fine pattern forming...

Details Near-field exposure photoresist and fine pattern forming... Near-field exposure photoresist and fine pattern forming...

2006-04-04

2006-04-04

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Post imaging treatment with particles

C430S165000, C430S192000, C430S313000, C430S316000, C430S317000

Reexamination Certificate

active

07022463

ABSTRACT:
A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field exposure, a photoacid generator which generates acid by the near-field exposure, and a solvent.

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