Photoresist polymer and photoresist composition containing...

Details Photoresist polymer and photoresist composition containing... Photoresist polymer and photoresist composition containing...

2006-10-31

2006-10-31

Le, Hoa Van (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S285100, C525S029000, C526S318000, C528S010000, C528S041000

Reexamination Certificate

active

07129023

ABSTRACT:
Photoresist polymers and photoresist compositions are disclosed. A photoresist polymer comprising a polymerization repeating unit represented by Formula 1 is less sensitive to change in the amount of energy due to its higher active energy than that of a conventional photoresist polymer. As a result, a phenomenon that a pattern of an outer field region that receives a relatively large amount of light becomes too thin is alleviated without additional dummy patterns when pattern is formed, and pattern collapse caused by a high aspect ratio due to high etching resistance is prevented.Formula 1whereinR1–R12, a, b, c and d are as defined in the description.

REFERENCES:
patent: 5976759 (1999-11-01), Urano et al.
patent: 6444408 (2002-09-01), Brock et al.
patent: 6818378 (2004-11-01), Endo
patent: 6844134 (2005-01-01), Choi et al.
patent: 7049044 (2006-05-01), Gonsalves et al.

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