Semiconductor device using SOI device and semiconductor...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S348000, C257S349000, C257S350000, C257S353000

Reexamination Certificate

active

07061049

ABSTRACT:
A semiconductor device includes a semiconductor layer provided on a semiconductor substrate with an insulating film interposed therebetween. A gate electrode is provided on the semiconductor layer with a gate insulating film interposed therebetween, and a pair of source/drain regions are formed in the semiconductor layer so as to hold a body region under the gate electrode therebetween. A control section supplies voltages to the source/drain regions. The control section supplies the body region in an OFF state and ON state with a first voltage and a second voltage different from the first voltage, respectively. The second voltage is set such that a potential of the body region in the OFF state is substantially the same as a potential of the body region in the ON state.

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F. Assaderaghi, et al., 1996 Symposium on VLSI Technology Digest of Technical Papers, pp. 122-123, “History Dependence of Non-Fully Depleted (NFD) Digital SOI Circuits”, 1996.

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