Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-03-09
2000-03-07
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430905, 430910, G03F 7004
Patent
active
06033827&
ABSTRACT:
To provide chemically amplified resist which is excellent in resolution, focusing and size accuracy as well by eliminating problem of the tapered resist pattern owing to the photo-absorption, and gives, at the same time, high thermal stability and sufficient resistance against dry-etching, resin having an aromatic ring is added in chemically amplified resist comprising a alicyclic acrylic polymer and a photoacid generator. As to the resin having the aromatic ring, it is preferably a polyhydroxystyrene polymer, a novolac polymer or a t-BOC protected polyhydroxystyrene polymer. Preferable additive amount of these polymers is 1 to 10 parts by weight to 100 parts of base polymer.
REFERENCES:
patent: 5230984 (1993-07-01), Tachiki et al.
patent: 5258257 (1993-11-01), Sinta et al.
patent: 5419998 (1995-05-01), Mayes et al.
patent: 5635332 (1997-06-01), Nakano et al.
patent: 5837419 (1998-11-01), Ushirogouchi et al.
"Positive Chemically Amplified Resist for ArF Excimer Laser Lithography COmposed of a Novel Transparent Photoacid Generator and an Alicyclic Terpolymer"; Nakano et al; Proceedings of the Society of Photo-opticl Instrumentation Engineers, vol. 2438; pp. 433-444; Jun. 1995.
Chu John S.
NEC Corporation
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