Polymer and resist material

Details Polymer and resist material Polymer and resist material

1996-12-19

2000-03-07

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430905, 525210, 525216, 525219, 525221, 525238, G03F 7004, C08C 3304

Patent

active

060338261

ABSTRACT:
A polymer of polyhydroxystyrene derivative containing an acetal or ketal group which can easily be eliminated in the presence of an acid in the molecule and having a very narrow molecular weight distribution gives a resist material suitable for forming ultrafine patterns excellent in resolution, heat resistance, mask linearity, and other properties without causing problems of delay time and the like.

REFERENCES:
patent: 5350660 (1994-09-01), Urano et al.
patent: 5352564 (1994-10-01), Takeda et al.
patent: 5468589 (1995-11-01), Urano et al.
patent: 5558971 (1996-09-01), Urano et al.
patent: 5627006 (1997-05-01), Urano et al.

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