Photoresist polymer and photoresist composition containing...

Details Photoresist polymer and photoresist composition containing... Photoresist polymer and photoresist composition containing...

2006-08-01

2006-08-01

Lee, Sin (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S326000, C430S905000, C430S907000, C430S914000, C430S921000, C430S919000, C430S920000, C430S925000, C430S311000, C430S319000, C430S327000, C430S328000, C430S330000, C430S331000, C525S327700, C526S281000, C526S242000, C526S271000, C526S256000, C526S268000

Reexamination Certificate

active

07083893

ABSTRACT:
Photoresist polymers and photoresist compositions are disclosed. A photoresist polymer represented by Formula 1 and a photoresist composition containing the same have excellent etching resistance, thermal resistance and adhesive property, and high affinity to an developing solution, thereby improving LER (line edge roughness).wherein X1, X2, R1, R2, m, n, a, b and c are as defined in the description.

REFERENCES:
patent: 6455226 (2002-09-01), Lee et al.
patent: 2002/0172886 (2002-11-01), Momota et al.
patent: 2003/0235785 (2003-12-01), Barclay et al.
patent: 1164434 (2001-12-01), None

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