Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Reexamination Certificate
2006-03-28
2006-03-28
Pham, Hoai (Department: 2891)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
On insulating substrate or layer
C438S158000
Reexamination Certificate
active
07018872
ABSTRACT:
A method for manufacturing an organic thin-film transistor, comprising a substrate, a gate electrode, a gate insulation layer, an organic semiconductor layer, a source electrode and a drain electrode, is disclosed, wherein the method comprises the steps of forming the gate electrode on the substrate, forming the gate insulation layer on the substrate, forming the semiconductor layer on the substrate, applying a metal particle dispersion containing metal particles on the substrate, gate insulation layer or organic semiconductor layer to form an electrode precursor layer comprised of the metal particles, and heat-fusing the metal particles in the electrode precursor layer to form the source electrode and the drain electrode.
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patent: 2003/0102472 (2003-06-01), Kelley et al.
Hirai Katsura
Kitamura Shigehiro
Cantor & Colburn LLP
Farahani Dana
Konica Corporation
Pham Hoai
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