Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-04-11
2006-04-11
Thornton, Yvette C. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S281100, C430S913000, C430S916000, C430S919000, C430S921000, C546S294000, C548S556000, C549S068000, C549S075000, C558S408000, C564S253000
Reexamination Certificate
active
07026094
ABSTRACT:
New oxime sulfonate compounds of the formula (I) and (II), wherein R1is C1-C12alkyl, C1C4haloalkyl, hydrogon, OR9, NR10R11, SR12or is phenyl which is unsubstituted or substituted by OH, C1-C18alkyl, halogen and/or C1-C12alkoxy; R2, R3, R4and R5are for example hydrogen or C1-C12alkyl; R6is for example is C1-C18alkylsulfonyl, phenyl-C1-C3alkylsulfonyl or phenylsulfonyl; R′6is for example phenylenedisulfonyl or diphenylenedisulfonyl; R7, R8and R9for example are hydrogen or C1-C6alkyl; R10and R11, are for example hydrogen or C1-C18alkyl; R12is for example hydrogen, phenyl or C1-C18alkyl; A is S, O, NR13, or a group of formula A1, A2 or A3, R21and R22 independently of one other have one of the meanings given for R7; R23, R24, R25and R26independently of one another are for example hydrogen, C1-C4alkyl, halogen or phenyl; Z is CR22or N; and Z1is CR22or N; and Z1is CR22or N; and Z1is CH2, S, O or NR13are particularly suitable as photo-latent acids in resist applications.
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Asakura Toshikage
Matsumoto Akira
Murer Peter
Ohwa Masaki
Yamato Hitoshi
Ciba Specialty Chemicals Corp.
Stevenson Tyler A.
Thornton Yvette C.
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