Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2006-07-18
2006-07-18
Flynn, Nathan J. (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S296000, C257S306000, C257S309000, C257SE29226
Reexamination Certificate
active
07078758
ABSTRACT:
A semiconductor technique is provided which can achieve both of lowered resistance in a logic formation region and reduced leakage current of the capacitor of a memory device. Source/drain regions (4) are formed in the upper surface of a semiconductor substrate (1) in a memory formation region and cobalt silicide films (9) are formed in the upper surfaces of the source/drain regions (4). Source/drain regions (54) are formed in the upper surface of the semiconductor substrate (1) in a logic formation region and cobalt silicide films (59) are formed in the upper surfaces of the source/drain regions (54). The cobalt silicide films (59) in the logic formation region are thicker than the cobalt silicide films (9) in the memory formation region.
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Renesas Technology Corp.
Wilson Scott R.
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