Static information storage and retrieval – Floating gate – Particular biasing
Reexamination Certificate
2006-07-11
2006-07-11
Zarabian, Amir (Department: 2827)
Static information storage and retrieval
Floating gate
Particular biasing
C365S185050, C365S185260, C257S017000, C257S135000, C257S302000, C438S156000, C438S157000, C438S175000, C438S176000, C438S206000, C438S263000, C438S268000, C438S270000, C438S282000
Reexamination Certificate
active
07075829
ABSTRACT:
Structures and methods for programmable memory address and decode circuits with low tunnel barrier interpoly insulators are provided. The decoder for a memory device includes a number of address lines and a number of output lines wherein the address lines and the output lines form an array. A number of logic cells are formed at the intersections of output lines and address lines. Each of the logic cells includes a floating gate transistor which includes a first source/drain region and a second source/drain region separated by a channel region in a substrate. A floating gate opposes the channel region and is separated therefrom by a gate oxide. A control gate opposing the floating gate. The control gate is separated from the floating gate by a low tunnel barrier intergate insulator. The low tunnel barrier intergate insulator includes a metal oxide insulator selected from the group consisting of PbO, Al2O3, Ta2O5, TiO2, ZrO2, Nb2O5and/or a Perovskite oxide tunnel barrier.
REFERENCES:
patent: 3978577 (1976-09-01), Bhattacharyya et al.
patent: 4295150 (1981-10-01), Adam
patent: 4412902 (1983-11-01), Michikami et al.
patent: 4449205 (1984-05-01), Hoffman
patent: 4495219 (1985-01-01), Kato et al.
patent: 4556975 (1985-12-01), Smith et al.
patent: 4672240 (1987-06-01), Smith et al.
patent: 4688078 (1987-08-01), Hseih
patent: 4717943 (1988-01-01), Wolf et al.
patent: 4757360 (1988-07-01), Faraone et al.
patent: 4780424 (1988-10-01), Holler et al.
patent: 4794565 (1988-12-01), Wu et al.
patent: 4870470 (1989-09-01), Bass, Jr. et al.
patent: 4939559 (1990-07-01), DiMaria et al.
patent: 5042011 (1991-08-01), Casper et al.
patent: 5071782 (1991-12-01), Mori
patent: 5073519 (1991-12-01), Rodder
patent: 5153880 (1992-10-01), Owen et al.
patent: 5280205 (1994-01-01), Green et al.
patent: 5350738 (1994-09-01), Hase et al.
patent: 5353431 (1994-10-01), Doyle et al.
patent: 5399516 (1995-03-01), Bergendahl et al.
patent: 5418389 (1995-05-01), Watanabe
patent: 5445984 (1995-08-01), Hong et al.
patent: 5455792 (1995-10-01), Yi
patent: 5474947 (1995-12-01), Chang et al.
patent: 5488612 (1996-01-01), Heybruck
patent: 5497494 (1996-03-01), Combs et al.
patent: 5498558 (1996-03-01), Kapoor
patent: 5508544 (1996-04-01), Shah
patent: 5510278 (1996-04-01), Nguyen et al.
patent: 5600592 (1997-02-01), Atsumi et al.
patent: 5617351 (1997-04-01), Bertin et al.
patent: 5618575 (1997-04-01), Peter
patent: 5619642 (1997-04-01), Nielsen et al.
patent: 5627785 (1997-05-01), Gilliam et al.
patent: 5646430 (1997-07-01), Kaya et al.
patent: 5677867 (1997-10-01), Hazani
patent: 5691209 (1997-11-01), Liberkowski
patent: 5691230 (1997-11-01), Forbes
patent: 5739544 (1998-04-01), Yuki et al.
patent: 5801401 (1998-09-01), Forbes
patent: 5852306 (1998-12-01), Forbes
patent: 5880991 (1999-03-01), Hsu et al.
patent: 5923056 (1999-07-01), Lee et al.
patent: 5936274 (1999-08-01), Forbes et al.
patent: 5952692 (1999-09-01), Nakazato et al.
patent: 5959465 (1999-09-01), Beat
patent: 5981350 (1999-11-01), Geusic et al.
patent: 5986932 (1999-11-01), Ratnakumar et al.
patent: 5991225 (1999-11-01), Forbes et al.
patent: 6009011 (1999-12-01), Yamauchi
patent: 6025228 (2000-02-01), Ibok et al.
patent: 6025627 (2000-02-01), Forbes et al.
patent: 6031263 (2000-02-01), Forbes et al.
patent: 6069380 (2000-05-01), Chou et al.
patent: 6069816 (2000-05-01), Nishimura
patent: 6077745 (2000-06-01), Burns et al.
patent: 6101131 (2000-08-01), Chang
patent: 6124729 (2000-09-01), Noble et al.
patent: 6127227 (2000-10-01), Lin et al.
patent: 6134175 (2000-10-01), Forbes et al.
patent: 6135175 (2000-10-01), Gaudreault et al.
patent: 6141238 (2000-10-01), Forbes et al.
patent: 6141248 (2000-10-01), Forbes et al.
patent: 6143636 (2000-11-01), Forbes et al.
patent: 6153468 (2000-11-01), Forbes et al.
patent: 6163049 (2000-12-01), Bui
patent: 6169306 (2001-01-01), Gardner et al.
patent: 6208164 (2001-03-01), Noble et al.
patent: 6210999 (2001-04-01), Gardner et al.
patent: 6229175 (2001-05-01), Uchida
patent: 6238976 (2001-05-01), Noble et al.
patent: 6246606 (2001-06-01), Forbes et al.
patent: 6249020 (2001-06-01), Forbes et al.
patent: 6249460 (2001-06-01), Forbes et al.
patent: 6288419 (2001-09-01), Prall et al.
patent: 6306708 (2001-10-01), Peng
patent: 6307775 (2001-10-01), Forbes et al.
patent: 6317364 (2001-11-01), Guterman et al.
patent: 6323844 (2001-11-01), Yeh et al.
patent: 6341084 (2002-01-01), Numata et al.
patent: 6351411 (2002-02-01), Forbes et al.
patent: 6377070 (2002-04-01), Forbes
patent: 6424001 (2002-07-01), Forbes et al.
patent: 6433382 (2002-08-01), Orlowski et al.
patent: 6440801 (2002-08-01), Furukawa et al.
patent: 6461931 (2002-10-01), Eldridge
patent: 6475857 (2002-11-01), Kim et al.
patent: 6476434 (2002-11-01), Noble et al.
patent: 6504207 (2003-01-01), Chen et al.
patent: 6514842 (2003-02-01), Prall et al.
patent: 6541280 (2003-04-01), Kaushik et al.
patent: 6566682 (2003-05-01), Forbes
patent: 6574143 (2003-06-01), Nakazato
patent: 6586797 (2003-07-01), Forbes et al.
patent: 6730575 (2004-05-01), Eldridge
patent: 6740928 (2004-05-01), Yoshii et al.
patent: 6754108 (2004-06-01), Forbes
patent: 6903367 (2005-06-01), Forbes
patent: 6950340 (2005-09-01), Bhattacharyya
patent: 6952032 (2005-10-01), Forbes et al.
patent: 2001/0013621 (2001-08-01), Nakazato
patent: 2001/0055838 (2001-12-01), Walkar et al.
patent: 2002/0028541 (2002-03-01), Lee et al.
patent: 2002/0106536 (2002-08-01), Lee et al.
patent: 2002/0137250 (2002-09-01), Nguyen et al.
patent: 2003/0042527 (2003-03-01), Forbes et al.
patent: 2003/0042532 (2003-03-01), Forbes
patent: 2003/0043622 (2003-03-01), Forbes
patent: 2003/0043630 (2003-03-01), Forbes et al.
patent: 2003/0043632 (2003-03-01), Forbes
patent: 2003/0043633 (2003-03-01), Forbes et al.
patent: 2003/0043637 (2003-03-01), Forbes et al.
patent: 2003/0045082 (2003-03-01), Eldridge et al.
patent: 2003/0048666 (2003-03-01), Eldridge et al.
patent: 2004/0004245 (2004-01-01), Forbes et al.
patent: 2004/0004247 (2004-01-01), Forbes et al.
patent: 2004/0004859 (2004-01-01), Forbes et al.
patent: 2005/0169054 (2005-08-01), Forbes
Bhattacharyya, A. , “Physical & Electrical Characteristics of LPCVD Silicon Rich Nitride”,ECS Technical Digest, J. Electrochem. Soc., 131(11), 691 RDP, New Orleans,(1984),469C.
Han, Kwangseok, “Characteristics of P-Channel Si Nano-Crystal Memory”,IEDM Technical Digest, International Electron Devices Meeting, (Dec. 10-13, 2000),309-312.
Inumiya, S , et al., “Conformable formation of high quality ultra-thin amorphous Ta2 O5 gate dielectrics utilizing water assisted deposition (WAD) for sub 50nm damascene metal gate MOSFETs”,IEDM Technical Digest. International Electron Devices Meeting, (Dec. 10-13, 2000),649-652.
Manchanda, L. , “Si-doped aluminates for high temperature metal-gate CMOS: Zr—Al—Si—O, a novel gate dielectric for low power applicatons”,IEDM Technical Digest. International Electron Devices Meeting, (Dec. 10-13, 2000),23-26.
Shi, Y. , “Tunneling Leakage Current in Ultrathin (<4nm) Nitride/Oxide Stack Dielectrics”,IEEE Electron Device Letters, 19(10), (1998),pp. 388-390.
Yamaguchi, Takeshi, “Band Diagram and Carrier Conduction Mechanism in ZrO2/Zr-silicate/Si MIS Structure Fabricated by Pulsed-laser-ablation Deposition”,Electron Devices Meeting, 2000, IEDM Technical Digest. International, (2000),19-22.
Zhang, H. , et al., “Atomic Layer Deposition of High Dielectric Constant Nanolaminates”,Journal of The Electrochemical Society, 148(4),(2001),F63-F66.
Aarik, Jaan, et al., “Anomalous effect of temperature on atomic layer deposition of titanium oxide”,Journal of Crystal Growth, (2000),pp. 531-537.
Aarik, Jaan , et al., “Texture developnment in nanocrystalline hafnium dioxide thin films grown by atomic layer deposition”,Journal of Crystal Growth, (2000),pp. 105-113.
Ferguson, J D., et al., “Atomic layer deposition of Al2O3 and SiO2 on BN particles using sequential surface reaction”,Applied Surface Science, (2000)
Pham Ly Duy
Zarabian Amir
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