Photoresist polymer and photoresist composition including...

Details Photoresist polymer and photoresist composition including... Photoresist polymer and photoresist composition including...

2006-07-25

2006-07-25

Kelly, Cynthia (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S331000, C430S311000, C430S905000, C430S906000, C430S910000, C430S914000, C430S921000, C430S920000, C430S925000, C430S942000, C430S945000, C430S919000, C430S966000, C526S307400, C526S307500

Reexamination Certificate

active

07081325

ABSTRACT:
Photoresist polymers and photoresist compositions containing the same are disclosed. A negative photoresist composition containing a photoresist polymer comprising a repeating unit represented by Formula 4 prevents collapse of patterns when photoresist patterns of less than 50 nm are formed. Accordingly, the disclosed negative photoresist composition is very effective for a photolithography process using EUV (Extreme Ultraviolet, 13 nm) light source.wherein R1, R2, R3, R4, R5, R6, R7, a, b and c are as defined in the description.

REFERENCES:
patent: 4151333 (1979-04-01), Lenke et al.
patent: 6593142 (2003-07-01), Kelly et al.
patent: 2003/0236375 (2003-12-01), Salamone et al.

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