Phase-shifting mask and semiconductor device

Details Phase-shifting mask and semiconductor device Phase-shifting mask and semiconductor device

2006-05-30

2006-05-30

Ngô, Ngân V. (Department: 2818)

Active solid-state devices (e.g., transistors, solid-state diode

Test or calibration structure

C257S629000

Reexamination Certificate

active

07053405

ABSTRACT:
Disclosed is a phase-shifting mask having a pattern comprising a plurality of substantially transparent regions and a plurality of substantially opaque regions wherein the mask pattern phase-shifts at least a portion of incident radiation and wherein the phases are substantially equally spaced, thereby increasing resolution of a given lithographic system. Further disclosed is a semiconductor device fabricated utilizing the phase-shifting mask.

REFERENCES:
patent: 6106981 (2000-08-01), Okamoto
patent: 6146955 (2000-11-01), Lee
patent: 0 090 924 (1983-10-01), None
patent: 0 492 630 (1992-07-01), None
patent: 0 730 200 (1996-09-01), None
patent: 2 291 218 (1996-01-01), None
Liebmann et al, “Alternating Phase Shifted Mask for Logic Gate Levels, Design and Mask Manufacturing”, SPIE, vol. 3679 p. 27 (1999).
Levenson et al, “Improving Resolution in Photolithography with a Phase-Shifting Mask”, IEEE Transactions on Electron Devices, ED-29, No. 12, p. 1828 (1982).

Affiliated with

Also associated with

Rating

Phase-shifting mask and semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Phase-shifting mask and semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phase-shifting mask and semiconductor device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3582823