Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2006-04-04

2006-04-04

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Focus or magnification control

C355S069000

Reexamination Certificate

active

07023524

ABSTRACT:
A lithographic apparatus including a radiation attenuator or a variable aperture system, such as masking blades, arranged in or adjacent an intermediate focus of the projection system. Besides a radiation attenuator or a variable aperture system, a measuring system may be arranged in the intermediate focus. By placing one or more of such systems in or adjacent the intermediate focus of the projection system, instead of adjacent the reticle in the illumination system, fewer design restrictions occur because of more space available, resulting in a lower design cost.

REFERENCES:
patent: 5323263 (1994-06-01), Schoenmakers
patent: 5757469 (1998-05-01), Allen
patent: 6741329 (2004-05-01), Leenders et al.
patent: 6859328 (2005-02-01), Schultz et al.
patent: 2001/0002155 (2001-05-01), Takahashi et al.
patent: 2002/0085286 (2002-07-01), Drodofsky et al.
patent: 2004/0013226 (2004-01-01), Bakker et al.
patent: 2004/0160583 (2004-08-01), Mulkens et al.
patent: 1 020 769 (2000-07-01), None
patent: 1 115 019 (2001-07-01), None

Affiliated with

Also associated with

Rating

Lithographic apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and device manufacturing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3580881