Method of fabricating sputter induced, micro-texturing of thin f

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

2041922, 20419222, C23C 1434

Patent

active

056205740

ABSTRACT:
Sputter induced micro-texturing of thin film magnetic media discs entailing the formation of micro-texturing globules comprising a eutectic alloy of Indium and Bismuth.

REFERENCES:
patent: 5053250 (1991-10-01), Baseman et al.
patent: 5192626 (1993-03-01), Sekiya et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of fabricating sputter induced, micro-texturing of thin f does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of fabricating sputter induced, micro-texturing of thin f, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating sputter induced, micro-texturing of thin f will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-357959

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.