Plasma treatment apparatus, matching box, impedance matching...

Details Plasma treatment apparatus, matching box, impedance matching... Plasma treatment apparatus, matching box, impedance matching...

2006-04-11

2006-04-11

Vo, Tuyet Thi (Department: 2821)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

Having glow discharge electrode gas energizing means

C156S345450, C118S7230ER, C118S7230IR

Reexamination Certificate

active

07025857

ABSTRACT:
A matching box is provided with a contact device insertion section serving as a slot into which a contact device is inserted. When the matching box is fixed on the outer wall of the side surface of a vacuum container, the matching box is positioned so as to be in a state where a space margin is provided between itself and a power feeding bar. Thereafter, electric contact between the external circuit and the power feeding bar is established by inserting a contact device into the contact device insertion section. A socket40provided at the output portion of an impedance matching device has, at the center portion of a metal body40aformed into a cylindrical structure, an insertion hole41for inserting a power feeding bar32thereinto to support it A cover layer42made of an insulation material is provided on the inner wall of the insertion hole41, thereby electrically insulating the insertion hole41from the power feeding bar32. A high frequency electricity generated by a second high frequency power source51is conducted to the power feeding bar32by inductive coupling.

REFERENCES:
patent: 5997687 (1999-12-01), Koshimizu
patent: 2004/0250770 (2004-12-01), Nakano et al.

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